Thin films of copper oxide and copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
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9783941003170
- Maße
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21 cm
- Umfang
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245 S.
- Sprache
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Englisch
- Anmerkungen
-
Ill., graph. Darst.
Zugl.: Chemnitz, Techn. Univ., Diss., 2010
- Schlagwort
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Kupfer
Kupferoxide
Dünne Schicht
Atomlagenabscheidung
Metallisieren
Ameisensäure
Atomschichtepitaxie
Ausgangsmaterial
Diketonate
Galvanische Abscheidung
Kupfer
Kupferoxide
Metallisierungsschicht
Reduktion
Ruthenium
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 13:41 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Wächtler, Thomas
- Univ.-Verl.
Entstanden
- 2010
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