Hochschulschrift
Thin films of copper oxide and copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices : = Dünne Schichten von Kupferoxid und Kupfer hergestellt mittels Atomlagenabscheidung zur Anwendung in Metallisierungssystemen mikroelektronischer Bauelemente
- Alternative title
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Dünne Schichten von Kupferoxid und Kupfer hergestellt mittels Atomlagenabscheidung zur Anwendung in Metallisierungssystemen mikroelektronischer Bauelemente
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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Chemnitz, Techn. Univ., Diss., 2010
- Keyword
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Kupfer
Kupferoxide
Dünne Schicht
Atomlagenabscheidung
Metallisieren
Ameisensäure
Atomschichtepitaxie
Ausgangsmaterial
Diketonate
Galvanische Abscheidung
Kupfer
Kupferoxide
Metallisierungsschicht
Reduktion
Ruthenium
- Creator
- URN
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urn:nbn:de:bsz:ch1-201000725
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:32 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
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