Hochschulschrift
Electrical Characterisation of Ferroelectric Field Effect Transistors based on Ferroelectric HfO2 Thin Films
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
-
2191-7167
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
Dresden, Technische Universität Dresden, Diss., 2015
- Klassifikation
-
Physik
- Schlagwort
-
Speicher
Halbleiterspeicher
MOS-Speicher
Nichtflüchtiger Speicher
Elektrischer Speicher
Speicherelement
Feldeffekttransistor
Ferroelektrischer Transistor
Hafniumdioxid
Dünne Schicht
- Ereignis
-
Veröffentlichung
- (wo)
-
Dresden
- (wer)
-
Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden
- (wann)
-
2015
- Ereignis
-
Veröffentlichung
- (wo)
-
Dresden
- (wer)
-
Technische Universität Dresden
- (wann)
-
2015
- Urheber
- Beteiligte Personen und Organisationen
- URN
-
urn:nbn:de:bsz:14-qucosa-172000
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:44 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Yurchuk, Ekaterina
- Mikolajick, Thomas
- Dörr, Kathrin
- Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden
- Technische Universität Dresden
Entstanden
- 2015
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