Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering ; day:12 ; month:01 ; year:2024 ; extent:13
Advanced materials interfaces ; (12.01.2024) (gesamt 13)
- Creator
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Timoshnev, Sergei
Kazakin, Alexey
Shubina, Ksenia
Andreeva, Valentina
Fedorenko, Elizaveta
Koroleva, Aleksandra
Zhizhin, Evgeniy
Koval, Olga
Kurinnaya, Alina
Shalin, Alexander
Bobrovs, Vjaceslavs
Enns, Yakov
- DOI
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10.1002/admi.202300815
- URN
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urn:nbn:de:101:1-2024011314211174123886
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:35 AM CEST
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Associated
- Timoshnev, Sergei
- Kazakin, Alexey
- Shubina, Ksenia
- Andreeva, Valentina
- Fedorenko, Elizaveta
- Koroleva, Aleksandra
- Zhizhin, Evgeniy
- Koval, Olga
- Kurinnaya, Alina
- Shalin, Alexander
- Bobrovs, Vjaceslavs
- Enns, Yakov
Other Objects (12)
Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)
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Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
Exploring the potential of serial magnetron co-sputtering
Doping and thickness variation influence on the structural and sensing properties of NiO film prepared by RF-magnetron sputtering
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Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)
Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment
Effect of annealing in the formation of well-crystallized and textured SrFe12O19 films grown by RF magnetron sputtering
Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
Exploring the potential of serial magnetron co-sputtering
Doping and thickness variation influence on the structural and sensing properties of NiO film prepared by RF-magnetron sputtering
An investigation of target poisoning during reactive magnetron sputtering
RuAl Thin‐Film Deposition by DC Magnetron Sputtering
An Investigation of Target Poisoning during Reactive Magnetron Sputtering
Magnetron Sputtering High-Entropy Alloy Coatings : A Mini-Review
Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)
Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment
Effect of annealing in the formation of well-crystallized and textured SrFe12O19 films grown by RF magnetron sputtering
Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
Exploring the potential of serial magnetron co-sputtering
Doping and thickness variation influence on the structural and sensing properties of NiO film prepared by RF-magnetron sputtering
An investigation of target poisoning during reactive magnetron sputtering
RuAl Thin‐Film Deposition by DC Magnetron Sputtering
An Investigation of Target Poisoning during Reactive Magnetron Sputtering