Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering ; day:12 ; month:01 ; year:2024 ; extent:13
Advanced materials interfaces ; (12.01.2024) (gesamt 13)
- Urheber
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Timoshnev, Sergei
Kazakin, Alexey
Shubina, Ksenia
Andreeva, Valentina
Fedorenko, Elizaveta
Koroleva, Aleksandra
Zhizhin, Evgeniy
Koval, Olga
Kurinnaya, Alina
Shalin, Alexander
Bobrovs, Vjaceslavs
Enns, Yakov
- DOI
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10.1002/admi.202300815
- URN
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urn:nbn:de:101:1-2024011314211174123886
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:35 MESZ
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Beteiligte
- Timoshnev, Sergei
- Kazakin, Alexey
- Shubina, Ksenia
- Andreeva, Valentina
- Fedorenko, Elizaveta
- Koroleva, Aleksandra
- Zhizhin, Evgeniy
- Koval, Olga
- Kurinnaya, Alina
- Shalin, Alexander
- Bobrovs, Vjaceslavs
- Enns, Yakov
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Effect of annealing in the formation of well-crystallized and textured SrFe12O19 films grown by RF magnetron sputtering
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Effect of annealing in the formation of well-crystallized and textured SrFe12O19 films grown by RF magnetron sputtering
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