Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering ; volume:10 ; pages:1511-1522
Beilstein journal of nanotechnology ; 10, 1511-1522
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.10.149
- URN
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urn:nbn:de:101:1-2020111914193003778013
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:26 MESZ
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