High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2150-5551
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
-
online resource.
- Erschienen in
-
High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering ; volume:4 ; number:1 ; day:19 ; month:3 ; year:2012 ; pages:40-44 ; date:3.2012
Nano-Micro letters ; 4, Heft 1 (19.3.2012), 40-44, 3.2012
- Urheber
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Han, Chengzhang
- Beteiligte Personen und Organisationen
-
Chen, Da
Zhang, Yaozhong
Xu, Dong
Liu, Yijian
Kong, Eric Siu-Wai
Zhang, Yafei
SpringerLink (Online service)
- DOI
-
10.1007/BF03353690
- URN
-
urn:nbn:de:1111-2016052052131
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:45 MESZ
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Beteiligte
- Han, Chengzhang
- Chen, Da
- Zhang, Yaozhong
- Xu, Dong
- Liu, Yijian
- Kong, Eric Siu-Wai
- Zhang, Yafei
- SpringerLink (Online service)
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