Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024) ; volume:11 ; number:9 ; year:2024 ; extent:1
Advanced materials interfaces ; 11, Heft 9 (2024) (gesamt 1)
- Creator
-
Timoshnev, Sergei
Kazakin, Alexey
Shubina, Ksenia
Andreeva, Valentina
Fedorenko, Elizaveta
Koroleva, Aleksandra
Zhizhin, Evgeniy
Koval, Olga
Kurinnaya, Alina
Shalin, Alexander
Bobrovs, Vjaceslavs
Enns, Yakov
- DOI
-
10.1002/admi.202470026
- URN
-
urn:nbn:de:101:1-2024032213231462679518
- Rights
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:47 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Timoshnev, Sergei
- Kazakin, Alexey
- Shubina, Ksenia
- Andreeva, Valentina
- Fedorenko, Elizaveta
- Koroleva, Aleksandra
- Zhizhin, Evgeniy
- Koval, Olga
- Kurinnaya, Alina
- Shalin, Alexander
- Bobrovs, Vjaceslavs
- Enns, Yakov
Other Objects (12)
Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering
Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment
Effect of annealing in the formation of well-crystallized and textured SrFe12O19 films grown by RF magnetron sputtering
Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
Exploring the potential of serial magnetron co-sputtering
Doping and thickness variation influence on the structural and sensing properties of NiO film prepared by RF-magnetron sputtering
RuAl Thin‐Film Deposition by DC Magnetron Sputtering
Magnetron Sputtering High-Entropy Alloy Coatings : A Mini-Review
An investigation of target poisoning during reactive magnetron sputtering
Fabrication of smooth SAC305 thin film via magnetron sputtering
Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering
Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment
Effect of annealing in the formation of well-crystallized and textured SrFe12O19 films grown by RF magnetron sputtering
Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
Exploring the potential of serial magnetron co-sputtering
Doping and thickness variation influence on the structural and sensing properties of NiO film prepared by RF-magnetron sputtering
RuAl Thin‐Film Deposition by DC Magnetron Sputtering
Magnetron Sputtering High-Entropy Alloy Coatings : A Mini-Review
An investigation of target poisoning during reactive magnetron sputtering
Fabrication of smooth SAC305 thin film via magnetron sputtering
Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering
Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment
Effect of annealing in the formation of well-crystallized and textured SrFe12O19 films grown by RF magnetron sputtering
Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
Exploring the potential of serial magnetron co-sputtering
Doping and thickness variation influence on the structural and sensing properties of NiO film prepared by RF-magnetron sputtering
RuAl Thin‐Film Deposition by DC Magnetron Sputtering
Magnetron Sputtering High-Entropy Alloy Coatings : A Mini-Review
An investigation of target poisoning during reactive magnetron sputtering