Hochschulschrift
Layer transfer of semiconductors and complex oxides by helium and,or hydrogen implantation and wafer bonding
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Maße
-
31 cm
- Umfang
-
99 Bl.
- Sprache
-
Englisch
- Anmerkungen
-
Ill., graph. Darst.
Halle, Univ., Diss., 2003 (Nicht für den Austausch)
- Klassifikation
-
Physik
- Schlagwort
-
Galliumarsenid
Dünne Schicht
Übertragung
Ionenimplantation
Wafer
Bonden
Halbleitersubstrat
Beschichten
Metalloxide
Oxidkeramik
- Urheber
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 13:53 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Objekttyp
- Hochschulschrift
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