Hochschulschrift
Wetting Optimized Solutions for Plasma Etch Residue Removal for Application in Interconnect Systems of Integrated Circuits
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
Chemnitz, Technische Universität Chemnitz, Dissertation, 2012
- Klassifikation
-
Elektrotechnik, Elektronik
- Schlagwort
-
Low-k-Dielektrikum
Plasmaätzen
Schädigung
Oberflächenreinigung
Wässrige Lösung
Tensidlösung
Benetzung
Verbindungstechnik
ULSI
Tensid
Benetzung
ULSI
- Ereignis
-
Veröffentlichung
- (wo)
-
Chemnitz, Chemnitz
- (wer)
-
Universitätsbibliothek Chemnitz, Universitätsverlag der Technischen Universität Chemnitz
- (wann)
-
2013
- Urheber
- Beteiligte Personen und Organisationen
-
Geßner, Thomas
Geßner, Thomas
Schulz, Stefan E.
Hietschold, Michael
- URN
-
urn:nbn:de:bsz:ch1-qucosa-102773
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:52 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Ahner, Nicole
- Geßner, Thomas
- Schulz, Stefan E.
- Hietschold, Michael
- Universitätsbibliothek Chemnitz, Universitätsverlag der Technischen Universität Chemnitz
Entstanden
- 2013
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