Hochschulschrift
Wetting Optimized Solutions for Plasma Etch Residue Removal for Application in Interconnect Systems of Integrated Circuits
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
Chemnitz, Technische Universität Chemnitz, Dissertation, 2012
- Classification
-
Elektrotechnik, Elektronik
- Keyword
-
Low-k-Dielektrikum
Plasmaätzen
Schädigung
Oberflächenreinigung
Wässrige Lösung
Tensidlösung
Benetzung
Verbindungstechnik
ULSI
Tensid
Benetzung
ULSI
- Event
-
Veröffentlichung
- (where)
-
Chemnitz, Chemnitz
- (who)
-
Universitätsbibliothek Chemnitz, Universitätsverlag der Technischen Universität Chemnitz
- (when)
-
2013
- Creator
- Contributor
-
Geßner, Thomas
Geßner, Thomas
Schulz, Stefan E.
Hietschold, Michael
- URN
-
urn:nbn:de:bsz:ch1-qucosa-102773
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:52 PM CET
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Ahner, Nicole
- Geßner, Thomas
- Schulz, Stefan E.
- Hietschold, Michael
- Universitätsbibliothek Chemnitz, Universitätsverlag der Technischen Universität Chemnitz
Time of origin
- 2013
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