Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Journal of Physics D: Applied Physics. 55
- Event
-
Veröffentlichung
- (where)
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Leipzig
- (who)
-
Universitätsbibliothek Leipzig
- (when)
-
2023
- Creator
-
Rudolph, M.
Brenning, N.
Hajihoseini, H.
Raadu, M.A.
Minea, T.M.
Anders, André
Gudmundsson, J.T.
Lundin, D.
- URN
-
urn:nbn:de:bsz:15-qucosa2-851377
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:51 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Rudolph, M.
- Brenning, N.
- Hajihoseini, H.
- Raadu, M.A.
- Minea, T.M.
- Anders, André
- Gudmundsson, J.T.
- Lundin, D.
- Universitätsbibliothek Leipzig
Time of origin
- 2023
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Transient transport phenomena in high power impulse magnetron sputtering discharges
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Analytic and numerical investigation of high power impulse magnetron sputtering discharges
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
Two-dimensional analytical description of the plasma potential in a magnetron discharge
Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges
Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
Gas discharge physics
Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge
Transient transport phenomena in high power impulse magnetron sputtering discharges
The influence of discharge power and heat treatment on calcium phosphate coatings prepared by RF magnetron sputtering deposition
Analytic and numerical investigation of high power impulse magnetron sputtering discharges
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
Two-dimensional analytical description of the plasma potential in a magnetron discharge
Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges
Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
Gas discharge physics
Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge
Transient transport phenomena in high power impulse magnetron sputtering discharges
The influence of discharge power and heat treatment on calcium phosphate coatings prepared by RF magnetron sputtering deposition
Analytic and numerical investigation of high power impulse magnetron sputtering discharges
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
Two-dimensional analytical description of the plasma potential in a magnetron discharge