- Alternative title
-
Substöchiometrische Hafniumoxid-Phasen mit Halbleitenden Eigenschaften
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
Darmstadt, Technische Universität Darmstadt, Dissertation, 2023
- Keyword
-
Nichtflüchtiger Speicher
Dünne Schicht
Hafniumdioxid
Dynamisches RAM
FRAM
- Event
-
Veröffentlichung
- (where)
-
Darmstadt
- (who)
-
Universitäts- und Landesbibliothek
- (when)
-
2023
- Creator
- Contributor
- DOI
-
10.26083/tuprints-00024217
- URN
-
urn:nbn:de:tuda-tuprints-242178
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
07.04.20255, 11:38 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Kaiser, Nico
- Alff, Lambert
- Molina-Luna, Leopoldo
- Universitäts- und Landesbibliothek
Time of origin
- 2023
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Hafnium oxide based ferroelectric devices for memories and beyond
Electron devices based on ferroelectric hafnium oxide thin films
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Influence of moisture on the ferroelectric properties of sputtered hafnium oxide thin films
Transparent semiconducting oxides for active multi-electrode arrays
Next Generation Ferroelectric Memories enabled by Hafnium Oxide
Impedance Spectroscopy on Hafnium Oxide‐Based Memristive Devices
Lanthanum-Doped Hafnium Oxide : A Robust Ferroelectric Material
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Flame Spray Synthesis of Semiconducting Oxide Nanomaterials - Fundamental Process Characterization and Control of Product Properties
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Pyroelectric and electrocaloric effects in hafnium oxide thin films
Hafnium oxide based ferroelectric devices for memories and beyond