- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
In: IEEE International Electron Devices Meeting (IEDM). San Francisco, 07.-11.12.2019
- Ereignis
-
Veröffentlichung
- (wo)
-
Dresden
- (wer)
-
Technische Universität Dresden
- (wann)
-
2022
- Urheber
-
Mikolajick, T.
Schroeder, U.
Lomenzo, P. D.
Breyer, E. T.
Mulaosmanovic, H.
Hoffmann, M.
Mittmann, T.
Mehmood, F.
Max, B.
Slesazeck, S.
- URN
-
urn:nbn:de:bsz:14-qucosa2-796869
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:27 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Mikolajick, T.
- Schroeder, U.
- Lomenzo, P. D.
- Breyer, E. T.
- Mulaosmanovic, H.
- Hoffmann, M.
- Mittmann, T.
- Mehmood, F.
- Max, B.
- Slesazeck, S.
- Technische Universität Dresden
Entstanden
- 2022
Ähnliche Objekte (12)
Variants of Ferroelectric Hafnium Oxide based Nonvolatile Memories
Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
Hafnium oxide based ferroelectric devices for memories and beyond
Novel Fluorite Structure Ferroelectric and Antiferroelectric Hafnium Oxide-based Nonvolatile Memories
Ferroelectric memories
Next-generation ferroelectric domain-wall memories: principle and architecture
Lanthanum-Doped Hafnium Oxide : A Robust Ferroelectric Material
Review on the Microstructure of Ferroelectric Hafnium Oxides
Chemical Solution Deposition of Ferroelectric Hafnium Oxide for Future Lead Free Ferroelectric Devices
Electron devices based on ferroelectric hafnium oxide thin films
Aging in Ferroelectric Si‐Doped Hafnium Oxide Thin Films
Variants of Ferroelectric Hafnium Oxide based Nonvolatile Memories
Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
Hafnium oxide based ferroelectric devices for memories and beyond
Novel Fluorite Structure Ferroelectric and Antiferroelectric Hafnium Oxide-based Nonvolatile Memories
Ferroelectric memories
Next-generation ferroelectric domain-wall memories: principle and architecture
Lanthanum-Doped Hafnium Oxide : A Robust Ferroelectric Material
Review on the Microstructure of Ferroelectric Hafnium Oxides
Chemical Solution Deposition of Ferroelectric Hafnium Oxide for Future Lead Free Ferroelectric Devices
Electron devices based on ferroelectric hafnium oxide thin films
Aging in Ferroelectric Si‐Doped Hafnium Oxide Thin Films
Variants of Ferroelectric Hafnium Oxide based Nonvolatile Memories
Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
Hafnium oxide based ferroelectric devices for memories and beyond
Novel Fluorite Structure Ferroelectric and Antiferroelectric Hafnium Oxide-based Nonvolatile Memories
Ferroelectric memories
Next-generation ferroelectric domain-wall memories: principle and architecture
Lanthanum-Doped Hafnium Oxide : A Robust Ferroelectric Material
Review on the Microstructure of Ferroelectric Hafnium Oxides
Chemical Solution Deposition of Ferroelectric Hafnium Oxide for Future Lead Free Ferroelectric Devices
Electron devices based on ferroelectric hafnium oxide thin films