Chemical Solution Deposition of Ferroelectric Hafnium Oxide for Future Lead Free Ferroelectric Devices
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: ECS journal of solid state science and technology 4(12), Seiten/Artikel-Nr.:P419-P423
- Classification
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Physik
- Event
-
Veröffentlichung
- (where)
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Aachen
- (who)
-
Universitätsbibliothek der RWTH Aachen
- (when)
-
2015
- Creator
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Starschich, Sergej
Griesche, David
Schneller, Theodor
Böttger, Ulrich
- DOI
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10.1149/2.0061512jss
- URN
-
urn:nbn:de:101:1-201804202814
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:45 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Starschich, Sergej
- Griesche, David
- Schneller, Theodor
- Böttger, Ulrich
- Universitätsbibliothek der RWTH Aachen
Time of origin
- 2015
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Next Generation Ferroelectric Memories enabled by Hafnium Oxide
Variants of Ferroelectric Hafnium Oxide based Nonvolatile Memories
Lanthanum-Doped Hafnium Oxide : A Robust Ferroelectric Material
Review on the Microstructure of Ferroelectric Hafnium Oxides
Aging in Ferroelectric Si‐Doped Hafnium Oxide Thin Films
Nonvolatile optical phase shift in ferroelectric hafnium zirconium oxide
Ferroelectric properties of undoped sputtered hafnium oxide thin films
Electron devices based on ferroelectric hafnium oxide thin films
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Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
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Next Generation Ferroelectric Memories enabled by Hafnium Oxide
Variants of Ferroelectric Hafnium Oxide based Nonvolatile Memories
Lanthanum-Doped Hafnium Oxide : A Robust Ferroelectric Material
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Aging in Ferroelectric Si‐Doped Hafnium Oxide Thin Films
Nonvolatile optical phase shift in ferroelectric hafnium zirconium oxide