- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
-
1556-276X
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
online resource.
- Erschienen in
-
Polystyrene negative resist for high-resolution electron beam lithography ; volume:6 ; number:1 ; day:12 ; month:7 ; year:2011 ; pages:1-6 ; date:12.2011
Nanoscale research letters ; 6, Heft 1 (12.7.2011), 1-6, 12.2011
- Urheber
-
Ma, Siqi
Con, Celal
Yavuz, Mustafa
Cui, Bo
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
-
10.1186/1556-276X-6-446
- URN
-
urn:nbn:de:101:1-2021081720373438047216
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:59 MESZ
Datenpartner
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Beteiligte
- Ma, Siqi
- Con, Celal
- Yavuz, Mustafa
- Cui, Bo
- SpringerLink (Online service)
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