- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
-
1556-276X
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
online resource.
- Bibliographic citation
-
Polystyrene negative resist for high-resolution electron beam lithography ; volume:6 ; number:1 ; day:12 ; month:7 ; year:2011 ; pages:1-6 ; date:12.2011
Nanoscale research letters ; 6, Heft 1 (12.7.2011), 1-6, 12.2011
- Creator
-
Ma, Siqi
Con, Celal
Yavuz, Mustafa
Cui, Bo
- Contributor
-
SpringerLink (Online service)
- DOI
-
10.1186/1556-276X-6-446
- URN
-
urn:nbn:de:101:1-2021081720373438047216
- Rights
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:59 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Ma, Siqi
- Con, Celal
- Yavuz, Mustafa
- Cui, Bo
- SpringerLink (Online service)
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Polystyrene Pocket Lithography: Sculpting Plastic with Light
A Polystyrene Photoresin for Direct Lithography of Microfluidic Chips
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CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature
Electron beam lithography contributions from Jena
High resolution electron beam lithography : an improved understanding of a versatile lithography technique
Electron beam lithography on nonplanar and irregular surfaces
High‐Resolution Lithography for High‐Frequency Organic Thin‐Film Transistors
Fabrication of carbon nanomembranes by helium ion beam lithography
Multi‐ and Gray‐Scale Thermal Lithography of Silk Fibroin as Water‐Developable Resist for Micro and Nanofabrication
Electron beam lithography of molecular glass resist films prepared by physical vapor deposition
Field emission scanning probe lithography on molecular resist
Polystyrene Pocket Lithography: Sculpting Plastic with Light
A Polystyrene Photoresin for Direct Lithography of Microfluidic Chips
A polystyrene photoresin for direct lithography of microfluidic chips
CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature
Electron beam lithography contributions from Jena
High resolution electron beam lithography : an improved understanding of a versatile lithography technique
Electron beam lithography on nonplanar and irregular surfaces
High‐Resolution Lithography for High‐Frequency Organic Thin‐Film Transistors
Fabrication of carbon nanomembranes by helium ion beam lithography