Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Notes: Ilmenau, TU Ilmenau, Dissertation, 2019

Classification: Physik

Keyword: Etching
Atomic layer deposition

Event: Veröffentlichung

(where): Ilmenau

(who): TU Ilmenau

(when): 2020

Creator: Dallorto, Stefano

Contributor: Rangelow, Ivo W.
Schwartzberg, Adam
Strehle, Steffen

URN: urn:nbn:de:gbv:ilm1-2019000480

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 14.08.2025, 11:01 AM CEST

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Associated

Dallorto, Stefano
Rangelow, Ivo W.
Schwartzberg, Adam
Strehle, Steffen
TU Ilmenau

Time of origin

2020

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Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching

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Time of origin

Other Objects (12)

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