Atomic layer processing : semiconductor dry etching technology

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Location: Deutsche Nationalbibliothek Frankfurt am Main

ISBN: 9783527346684
3527346686

Dimensions: 25 cm, 584 g

Extent: XIV, 284 Seiten

Language: Englisch

Notes: Illustrationen

Classification: Elektrotechnik, Elektronik

Keyword: Halbleitertechnologie
Trockenätzen
Plasmaätzen
Atomschichtätzen

Event: Veröffentlichung

(where): Weinheim

(who): Wiley-VCH

(when): 2021

Creator: Lill, Thorsten

Contributor: Wiley-VCH

Table of contents: https://d-nb.info/1217132317/04

Rights: Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.

Last update: 11.03.2025, 12:09 PM CET

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2021

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Atomic layer processing : semiconductor dry etching technology

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Time of origin

Other Objects (12)

Mesoporous germanium layer formation by electrochemical etching

Metastable atomic layer deposition

In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride

Atomic Layer Deposition and Microanalysis of Ultrathin Layers

Atomic Layer Deposition onto Fibers

Chemistry of atomic layer deposition

Etching

Boundary Layers for Quantum Semiconductor Models

Optical Characterization of epitaxial semiconductor layers

Low-temperature chromium dry etching for ultimate profile control towards single-digit nanofabrication

Atomic layer deposition of nanostructured materials

Atomic layer deposition on biological matter

Mesoporous germanium layer formation by electrochemical etching

Metastable atomic layer deposition

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Atomic Layer Deposition and Microanalysis of Ultrathin Layers

Atomic Layer Deposition onto Fibers

Chemistry of atomic layer deposition

Etching

Boundary Layers for Quantum Semiconductor Models

Optical Characterization of epitaxial semiconductor layers

Low-temperature chromium dry etching for ultimate profile control towards single-digit nanofabrication

Atomic layer deposition of nanostructured materials

Atomic layer deposition on biological matter

Mesoporous germanium layer formation by electrochemical etching

Metastable atomic layer deposition

In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride

Atomic Layer Deposition and Microanalysis of Ultrathin Layers

Atomic Layer Deposition onto Fibers

Chemistry of atomic layer deposition

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Low-temperature chromium dry etching for ultimate profile control towards single-digit nanofabrication

Atomic layer deposition of nanostructured materials

Atomic layer deposition on biological matter

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