In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Journal of vacuum science & technology. 40(3)
- Event
-
Veröffentlichung
- (where)
-
Dresden
- (who)
-
Technische Universität Dresden
- (when)
-
2024
- Creator
- URN
-
urn:nbn:de:bsz:14-qucosa2-911382
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:58 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Reif, Johanna
- Knaut, Martin
- Killge, Sebastian
- Albert, Matthias
- Mikolajick, Thomas
- Bartha, Johann W.
- Technische Universität Dresden
Time of origin
- 2024
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