A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy †
Atomic layer deposition (ALD) is a thin film growth technique based on the repeated use of separate, saturating gas‐solid reactions. The principle of ALD has been discovered twice; in the 1960s under the name “molecular layering” in the Soviet Union, and in the 1970s under the name “atomic layer epitaxy” (ALE) in Finland. In 2014, it is forty years since the filing of the worldwide patent on ALE as a method for the growth of compound thin films. This essay celebrates the fortieth anniversary of ALE‐ALD, briefly telling the story of ALE as shared by its Finnish inventor, Dr. Tuomo Suntola. Initially, ALE was aimed at the growth of high‐quality polycrystalline ZnS thin films for electroluminescent (EL) display panels. Gradually, the material selection of ALE increased, and the application areas were extended to photovoltaics, catalysis, semiconductor devices, and beyond. Fast, production‐worthy ALE reactors were imperative for industrial success. The unprejudiced creation of new technologies and products with ALE, initiated by Dr. Tuomo Suntola and led by him until early 1998, are an integral part of the Finnish industrial history, the fruits of which are seen today in numerous applications worldwide.
This essay celebrates the fortieth anniversary of ALD in Finland, telling the story of ALE as shared by its inventor, Dr. Tuomo Suntola. The creation of new technologies and products with ALE‐ALD, initiated by Dr. Tuomo Suntola and led by him until early 1998, are an integral part of the Finnish industrial history, the fruits of which are seen forty years later in numerous applications worldwide.
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy † ; volume:20 ; number:10-11-12 ; year:2014 ; pages:332-344 ; extent:13
Chemical vapor deposition ; 20, Heft 10-11-12 (2014), 332-344 (gesamt 13)
- Urheber
-
Puurunen, Riikka L.
- DOI
-
10.1002/cvde.201402012
- URN
-
urn:nbn:de:101:1-2023010207124671284427
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:35 MESZ
Datenpartner
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Puurunen, Riikka L.
Ähnliche Objekte (12)
Metastable atomic layer deposition
Particle atomic layer deposition
Chemistry of atomic layer deposition
Atomic Layer Deposition onto Fibers
Advances in Atomic Layer Deposition
Atomic Layer Deposition and Microanalysis of Ultrathin Layers
Atomic layer deposition of nanostructured materials
Atomic layer deposition on biological matter
Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching
Atomic layer deposition in energy conversion applications
Catalyst synthesis and modification via atomic layer deposition
Fabrication of buried nanostructures by atomic layer deposition
Metastable atomic layer deposition
Particle atomic layer deposition
Chemistry of atomic layer deposition
Atomic Layer Deposition onto Fibers
Advances in Atomic Layer Deposition
Atomic Layer Deposition and Microanalysis of Ultrathin Layers
Atomic layer deposition of nanostructured materials
Atomic layer deposition on biological matter
Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching
Atomic layer deposition in energy conversion applications
Catalyst synthesis and modification via atomic layer deposition
Fabrication of buried nanostructures by atomic layer deposition
Metastable atomic layer deposition
Particle atomic layer deposition
Chemistry of atomic layer deposition
Atomic Layer Deposition onto Fibers
Advances in Atomic Layer Deposition
Atomic Layer Deposition and Microanalysis of Ultrathin Layers
Atomic layer deposition of nanostructured materials
Atomic layer deposition on biological matter
Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching
Atomic layer deposition in energy conversion applications
Catalyst synthesis and modification via atomic layer deposition