- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
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Sputter Depth Profiling of Thin Films ; volume:17 ; number:1-2 ; year:1998 ; pages:13-28
High temperature materials and processes ; 17, Heft 1-2 (1998), 13-28
- Urheber
-
Hofmann,, Siegfried
- DOI
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10.1515/HTMP.1998.17.1-2.13
- URN
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urn:nbn:de:101:1-2501260514367.363192417226
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:25 MESZ
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Beteiligte
- Hofmann,, Siegfried
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