Hochschulschrift
Stress and microstructure of sputter deposited thin copper and niobium films
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Dimensions
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21 cm
- Extent
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IX, 93 S.
- Language
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Englisch
- Notes
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Ill., graph. Darst.
Zugl.: Stuttgart, Univ., Diss., 2003
- Bibliographic citation
-
Bericht / Max-Planck-Institut für Metallforschung ; Nr. 132
- Keyword
-
Metallschicht
Sputtern
Mechanische Spannung
Texturanalyse
Röntgenbeugung
Elastische Spannung / Messung ; Mikrostruktur ; Textur ; Röntgenbeugung
- Event
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Veröffentlichung
- (where)
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Stuttgart
- (who)
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Max-Planck-Inst. für Metallforschung
- (when)
-
2003
- Creator
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 1:34 PM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Okolo, Brando Chidi
- Max-Planck-Inst. für Metallforschung
Time of origin
- 2003
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Laser beam welding of deoxidized copper : microstructure investigation and thermodynamic consideration
Stress and microstructure of sputter deposited thin copper and niobium films
Controllable growth, microstructure and electronic structure of copper oxide thin films
Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition
Nanocrystalline thin films : microstructure, stability and properties
The microstructure of confined and thin polymer films
Growth of obliquely deposited metallic thin films
Microstructure and grain boundary evolution in titanium thin films
Interrelationship of interdiffusion and microstructure in thin film systems
Fabrication and characterisation of copper nanowires electrochemically deposited in etched ion track membranes
Fabrication and characterisation of copper nanowires electrochemically deposited in etched ion track membranes
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