Hochschulschrift
Stress and microstructure of sputter deposited thin copper and niobium films
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Maße
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21 cm
- Umfang
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IX, 93 S.
- Sprache
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Englisch
- Anmerkungen
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Ill., graph. Darst.
Zugl.: Stuttgart, Univ., Diss., 2003
- Erschienen in
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Bericht / Max-Planck-Institut für Metallforschung ; Nr. 132
- Schlagwort
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Metallschicht
Sputtern
Mechanische Spannung
Texturanalyse
Röntgenbeugung
Elastische Spannung / Messung ; Mikrostruktur ; Textur ; Röntgenbeugung
- Ereignis
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Veröffentlichung
- (wo)
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Stuttgart
- (wer)
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Max-Planck-Inst. für Metallforschung
- (wann)
-
2003
- Urheber
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 13:34 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Okolo, Brando Chidi
- Max-Planck-Inst. für Metallforschung
Entstanden
- 2003
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