100 nm half–pitch double exposure KrF lithography using binary masks

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Notes: In: Proc. SPIE 6924, Optical Microlithography XXI, 69241Z (11 April 2008); https://doi.org/10.1117/12.771333

Event: Veröffentlichung

(where): Wildau

(who): Technische Hochschule Wildau

(when): 2008

Creator: Geisler, Sebastian
Bauer, Joachim
Haak, Ulrich
Stolarek, David
Schulz, K.
Wolf, H.
Meier, W.
Trojahn, M.
Matthus, E.

URN: urn:nbn:de:kobv:526-opus4-15169

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 15.08.2025, 7:25 AM CEST

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Associated

Geisler, Sebastian
Bauer, Joachim
Haak, Ulrich
Stolarek, David
Schulz, K.
Wolf, H.
Meier, W.
Trojahn, M.
Matthus, E.
Technische Hochschule Wildau

Time of origin

2008

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100 nm half–pitch double exposure KrF lithography using binary masks

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Time of origin

Other Objects (12)

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