Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Bibliographic citation: Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices ; volume:3 ; pages:884-892
Beilstein journal of nanotechnology ; 3, 884-892

Classification: Ingenieurwissenschaften und Maschinenbau

DOI: 10.3762/bjnano.3.98

URN: urn:nbn:de:101:1-2013012219839

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 14.08.2025, 10:56 AM CEST

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Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

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Other Objects (12)

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