Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Erschienen in
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Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices ; volume:3 ; pages:884-892
Beilstein journal of nanotechnology ; 3, 884-892
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.3.98
- URN
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urn:nbn:de:101:1-2013012219839
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.2025, 10:56 MESZ
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