Inert Mask Lithography of Edge Narrowed Graphene Nanoribbons Directly Contacted to Metallic Electrodes
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Inert Mask Lithography of Edge Narrowed Graphene Nanoribbons Directly Contacted to Metallic Electrodes ; day:29 ; month:09 ; year:2021 ; extent:7
Advanced materials interfaces ; (29.09.2021) (gesamt 7)
- Creator
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Arjmandi‐Tash, Hadi
Bellunato, Amedeo
van der Ham, Alex
Schneider, Grégory F.
- DOI
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10.1002/admi.202100293
- URN
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urn:nbn:de:101:1-2021092915172982915499
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:31 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Arjmandi‐Tash, Hadi
- Bellunato, Amedeo
- van der Ham, Alex
- Schneider, Grégory F.