Inert Mask Lithography of Edge Narrowed Graphene Nanoribbons Directly Contacted to Metallic Electrodes

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Inert Mask Lithography of Edge Narrowed Graphene Nanoribbons Directly Contacted to Metallic Electrodes ; day:29 ; month:09 ; year:2021 ; extent:7
Advanced materials interfaces ; (29.09.2021) (gesamt 7)

Creator
Arjmandi‐Tash, Hadi
Bellunato, Amedeo
van der Ham, Alex
Schneider, Grégory F.

DOI
10.1002/admi.202100293
URN
urn:nbn:de:101:1-2021092915172982915499
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:31 AM CEST

Data provider

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Associated

  • Arjmandi‐Tash, Hadi
  • Bellunato, Amedeo
  • van der Ham, Alex
  • Schneider, Grégory F.

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