One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures ; volume:13 ; number:1 ; day:5 ; month:12 ; year:2018 ; pages:1-9 ; date:12.2018
Nanoscale research letters ; 13, Heft 1 (5.12.2018), 1-9, 12.2018

Classification
Technische Chemie

Creator
Tan, Xianhua
Shi, Tielin
Lin, Jianbin
Sun, Bo
Tang, Zirong
Liao, Guanglan
Contributor
SpringerLink (Online service)

DOI
10.1186/s11671-018-2817-6
URN
urn:nbn:de:101:1-2019012322503342371809
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:44 AM CEST

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Associated

  • Tan, Xianhua
  • Shi, Tielin
  • Lin, Jianbin
  • Sun, Bo
  • Tang, Zirong
  • Liao, Guanglan
  • SpringerLink (Online service)

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