Quantified Uniformity and Selectivity of TiO 2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Quantified Uniformity and Selectivity of TiO 2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles ; day:17 ; month:06 ; year:2023 ; extent:11
Advanced materials interfaces ; (17.06.2023) (gesamt 11)

Creator
Nye, Rachel A.
Van Dongen, Kaat
de Marneffe, Jean‐François
Parsons, Gregory N.
Delabie, Annelies

DOI
10.1002/admi.202300163
URN
urn:nbn:de:101:1-2023061815012317747453
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:46 AM CEST

Data provider

This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.

Associated

  • Nye, Rachel A.
  • Van Dongen, Kaat
  • de Marneffe, Jean‐François
  • Parsons, Gregory N.
  • Delabie, Annelies

Other Objects (12)