Quantified Uniformity and Selectivity of TiO 2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Quantified Uniformity and Selectivity of TiO 2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles ; day:17 ; month:06 ; year:2023 ; extent:11
Advanced materials interfaces ; (17.06.2023) (gesamt 11)
- Creator
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Nye, Rachel A.
Van Dongen, Kaat
de Marneffe, Jean‐François
Parsons, Gregory N.
Delabie, Annelies
- DOI
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10.1002/admi.202300163
- URN
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urn:nbn:de:101:1-2023061815012317747453
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:46 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Nye, Rachel A.
- Van Dongen, Kaat
- de Marneffe, Jean‐François
- Parsons, Gregory N.
- Delabie, Annelies