Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: 10.7567/APEX.9.076701
- Event
-
Veröffentlichung
- (where)
-
Aachen
- (who)
-
Universitätsbibliothek der RWTH Aachen
- (when)
-
2016
- Creator
-
Kim, Hyun-su
Baksh, Peter
Odstrčil, Michal
Miszczak, Magdalena
Frey, Jeremy G.
Juschkin, Larissa
Brocklesby, William S.
- DOI
-
10.18154/RWTH-2016-04448
- URN
-
urn:nbn:de:101:1-2018101912022310929523
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:43 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Kim, Hyun-su
- Baksh, Peter
- Odstrčil, Michal
- Miszczak, Magdalena
- Frey, Jeremy G.
- Juschkin, Larissa
- Brocklesby, William S.
- Universitätsbibliothek der RWTH Aachen
Time of origin
- 2016
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Interference lithography with extreme ultraviolet light
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Passive triggering of a high power hollow cathode EUV lamp for lithography
Phase Mask Pinholes as Spatial Filters for Laser Interference Lithography
Periodic materials and interference lithography for photonics, phononics and mechanics
General mathematical model for the period chirp in interference lithography
Templated fabrication of periodic nanostructures based on laser interference lithography
Laser interference lithography : micropatterning of polymer surface for cell adhesion
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
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Optics: Multiple Beam Interference: Plane mirror cavity - diverging beams
Optics: Multiple Beam Interference: Curved mirror cavity - radial modes
Interference lithography with extreme ultraviolet light
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Passive triggering of a high power hollow cathode EUV lamp for lithography
Phase Mask Pinholes as Spatial Filters for Laser Interference Lithography
Periodic materials and interference lithography for photonics, phononics and mechanics
General mathematical model for the period chirp in interference lithography
Templated fabrication of periodic nanostructures based on laser interference lithography
Laser interference lithography : micropatterning of polymer surface for cell adhesion
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Optics: Multiple Beam Interference: Plane mirror cavity - collimated beams
Optics: Multiple Beam Interference: Plane mirror cavity - diverging beams