Hochschulschrift
Passive triggering of a high power hollow cathode EUV lamp for lithography
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783832249106
3832249109
- Dimensions
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21 cm, 225 gr.
- Extent
-
150 S.
- Language
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Englisch
- Notes
-
Ill., graph. Darst.
Zugl.: Aachen, Techn. Hochsch., Diss., 2005
- Classification
-
Physik
- Keyword
-
Lithografie
Extremes Ultraviolett
Hohlkathodenentladung
Pinch
Lithography
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 1:58 PM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Smith, Christopher Sydney
- Shaker
Time of origin
- 2006
Other Objects (12)
Optical and EUV Lithography: A Modeling Perspective
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
A study of hydrogen plasma-induced charging effect in EUV lithography systems
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Novel Photobase Generators Derived from Proazaphosphatrane–Aryl Borate for High‐Pressure Mercury Lamp Lithography
Lithography.
EUV, AEUV : Kommentar
Optical and EUV Lithography: A Modeling Perspective
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
A study of hydrogen plasma-induced charging effect in EUV lithography systems
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Novel Photobase Generators Derived from Proazaphosphatrane–Aryl Borate for High‐Pressure Mercury Lamp Lithography
Lithography.
EUV, AEUV : Kommentar
Optical and EUV Lithography: A Modeling Perspective
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
A study of hydrogen plasma-induced charging effect in EUV lithography systems
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Novel Photobase Generators Derived from Proazaphosphatrane–Aryl Borate for High‐Pressure Mercury Lamp Lithography
Lithography.