- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
Optical and EUV Lithography: A Modeling Perspective ; volume:10 ; number:2 ; year:2021 ; pages:85-86 ; extent:02
Advanced Optical Technologies ; 10, Heft 2 (2021), 85-86 (gesamt 02)
- Urheber
-
Melvin, Lawrence S.
- DOI
-
10.1515/aot-2021-0018
- URN
-
urn:nbn:de:101:1-2405071655042.358713707289
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:46 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Melvin, Lawrence S.
Ähnliche Objekte (12)
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
Passive triggering of a high power hollow cathode EUV lamp for lithography
A study of hydrogen plasma-induced charging effect in EUV lithography systems
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Advances in Grayscale Lithography Modeling
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Compact Mask Models for Optical Projection Lithography
Resonant metamaterials for contrast enhancement in optical lithography
Three-dimensional optical lithography beyond the diffraction limit
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
Passive triggering of a high power hollow cathode EUV lamp for lithography
A study of hydrogen plasma-induced charging effect in EUV lithography systems
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Advances in Grayscale Lithography Modeling
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Compact Mask Models for Optical Projection Lithography
Resonant metamaterials for contrast enhancement in optical lithography
Three-dimensional optical lithography beyond the diffraction limit
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
Passive triggering of a high power hollow cathode EUV lamp for lithography
A study of hydrogen plasma-induced charging effect in EUV lithography systems
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Advances in Grayscale Lithography Modeling
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Compact Mask Models for Optical Projection Lithography
Resonant metamaterials for contrast enhancement in optical lithography