Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: 10.1109/JPHOT.2016.2553847
- Event
-
Veröffentlichung
- (where)
-
Aachen
- (who)
-
Universitätsbibliothek der RWTH Aachen
- (when)
-
2016
- Creator
- DOI
-
10.18154/RWTH-2016-04166
- URN
-
urn:nbn:de:101:1-2019061714535334665850
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:42 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Kim, Hyun-su
- Li, Wei
- Marconi, Mario C.
- Brocklesby, William S.
- Juschkin, Larissa
- Universitätsbibliothek der RWTH Aachen
Time of origin
- 2016
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Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Passive triggering of a high power hollow cathode EUV lamp for lithography
Lithography.
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Toward Restorative Constitutionalism?
Restorative justice : a European and Schleswig-Holsteinian perspective = Restorative justice
Direct lithography
Advances in restorative dentistry
EUV, AEUV : Kommentar
Rough paths and rough volatility
ROUGH"
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Passive triggering of a high power hollow cathode EUV lamp for lithography
Lithography.
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Toward Restorative Constitutionalism?
Restorative justice : a European and Schleswig-Holsteinian perspective = Restorative justice
Direct lithography
Advances in restorative dentistry
EUV, AEUV : Kommentar
Rough paths and rough volatility