- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
Optical and EUV Lithography: A Modeling Perspective ; volume:10 ; number:2 ; year:2021 ; pages:85-86 ; extent:02
Advanced Optical Technologies ; 10, Heft 2 (2021), 85-86 (gesamt 02)
- Creator
-
Melvin, Lawrence S.
- DOI
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10.1515/aot-2021-0018
- URN
-
urn:nbn:de:101:1-2405071655042.358713707289
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:46 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Melvin, Lawrence S.
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Compact Mask Models for Optical Projection Lithography
Resonant metamaterials for contrast enhancement in optical lithography
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Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
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Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Advances in Grayscale Lithography Modeling
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Compact Mask Models for Optical Projection Lithography
Resonant metamaterials for contrast enhancement in optical lithography
Three-dimensional optical lithography beyond the diffraction limit
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
Passive triggering of a high power hollow cathode EUV lamp for lithography
A study of hydrogen plasma-induced charging effect in EUV lithography systems
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography
Advances in Grayscale Lithography Modeling
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Correction to “Evaluation of H 2 Plasma‐Induced Damage in Materials for EUV Lithography”
Compact Mask Models for Optical Projection Lithography
Resonant metamaterials for contrast enhancement in optical lithography