Thin films material technology : sputtering of compound materials
An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin film, a key technology for nano- materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts. Key topics: ? Principles and examples of making thin-film materials and devices such as nanometer composite thin films, nanometer superlattice of compound ceramics, micro-sensors and actuators, micro-MEMS, mobile compact/flexible ferroelectric memory, flat display including plasma display and PLD, and thin film catalysis, solar battery, and large-area functional window glass coating for energy and environmental uses. ? Covers techniques in automotive parts coatings :non-peel plastics coatings with metal, alloy, and compound films. TOC:Thin Film Materials And Devices.- Thin Film Processes.- Sputtering Phenomena.- Sputtering Systems.- Deposition Of Compound Thin Films.- Structural Control Of Compound Thin Films.- Microfabrication By Sputtering.- Appendix.- Index.
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783540211181
3540211187
9780815514831
0815514832
- Dimensions
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24 cm
- Extent
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XIV, 518 S.
- Language
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Englisch
- Notes
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Ill., graph. Darst.
Literaturangaben
- Classification
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Ingenieurwissenschaften und Maschinenbau
- Keyword
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Dünne Schicht
Sputtern
- Event
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Veröffentlichung
- (where)
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Norwich, NY, Heidelberg
- (who)
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Andrew, Springer
- (when)
-
2004
- Creator
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.03.2025, 11:56 AM CET
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Wasa, Kiyotaka
- Kitabatake, Makoto
- Adachi, Hideaki
- Andrew, Springer
Time of origin
- 2004
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Sputtering data
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Metal-semiconductor transition materials : FeS and VO2 thin films by RF reactive sputtering
Multi-target sputtering technology of Pb(Zr,Ti)O3 thin films for electron devices
Zinc Oxide Thin Film Transistors by Radio Frequency Magnetron Sputtering
Focused Ion Beam Sputtering of Silicon and Related Materials
Fabrication and study of ito thin films prepared by magnetron sputtering
Realization of solid state thin film lithium batteries via magnetron sputtering
Fabrication and study of ITO thin films prepared by magnetron sputtering
Sputtering data
Deposition of cubic boron nitride thin films by radio frequency bias sputtering
Li-Si thin films for battery applications produced by ion-beam co-sputtering
Multiple scale modeling of Al2O3 thin film growth in an ion beam sputtering process
Roll-to-roll sputtering of thermochromic VO2-based coatings onto ultra-thin flexible glass
Metal-semiconductor transition materials : FeS and VO2 thin films by RF reactive sputtering
Multi-target sputtering technology of Pb(Zr,Ti)O3 thin films for electron devices
Zinc Oxide Thin Film Transistors by Radio Frequency Magnetron Sputtering
Focused Ion Beam Sputtering of Silicon and Related Materials
Fabrication and study of ito thin films prepared by magnetron sputtering
Realization of solid state thin film lithium batteries via magnetron sputtering
Fabrication and study of ITO thin films prepared by magnetron sputtering
Sputtering data
Deposition of cubic boron nitride thin films by radio frequency bias sputtering
Li-Si thin films for battery applications produced by ion-beam co-sputtering
Multiple scale modeling of Al2O3 thin film growth in an ion beam sputtering process