Thermal stability of magnetron sputtered W/HfO₂ and Ir/HfO₂ thin films used as selective emitter in thermophotovoltaic applications
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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In: Technische Universität Hamburg (2023)
Hamburg, Technische Universität Hamburg, Dissertation, 2023
- Keyword
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Dünne Schicht
Magnetronsputtern
Silicium
Nanostrukturiertes Material
Sputtern
Röntgenbeugung
- Event
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Veröffentlichung
- (where)
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Hamburg
- (who)
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Technische Universität Hamburg. Universitätsbibliothek
- (when)
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2023
- DOI
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10.15480/882.8364
- URN
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urn:nbn:de:101:1-2023122010583847847326
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:46 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Krishnamurthy, Gnanavel Vaidhyanathan
- Technische Universität Hamburg. Universitätsbibliothek
Time of origin
- 2023
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Interplay between ferroelectric and resistive switching in doped crystalline HfO₂
Material perspectives of HfO₂-based ferroelectric films for device applications
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