Thermal stability of magnetron sputtered W/HfO₂ and Ir/HfO₂ thin films used as selective emitter in thermophotovoltaic applications
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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In: Technische Universität Hamburg (2023)
Hamburg, Technische Universität Hamburg, Dissertation, 2023
- Schlagwort
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Dünne Schicht
Magnetronsputtern
Silicium
Nanostrukturiertes Material
Sputtern
Röntgenbeugung
- Ereignis
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Veröffentlichung
- (wo)
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Hamburg
- (wer)
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Technische Universität Hamburg. Universitätsbibliothek
- (wann)
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2023
- DOI
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10.15480/882.8364
- URN
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urn:nbn:de:101:1-2023122010583847847326
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:46 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Krishnamurthy, Gnanavel Vaidhyanathan
- Technische Universität Hamburg. Universitätsbibliothek
Entstanden
- 2023
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