Electromigration resistance and mechanical strength: new perspectives for interconnect materials?
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
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In: Thin films: stresses and mechanical properties III : symposium held December 2 - 5, 1991, Boston, Massachusetts, USA. - Pittsburgh, Pa : Materials Research Society, 1992. - (Materials Research Society symposium proceedings ; 239), S. 677-682
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- Schlagwort
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Festigkeit ; Elektromigration
- Ereignis
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Veröffentlichung
- (wo)
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Saarbrücken
- (wer)
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Saarländische Universitäts- und Landesbibliothek
- (wann)
-
2008
- Beteiligte Personen und Organisationen
- URN
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urn:nbn:de:bsz:291-scidok-17929
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 11:01 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Arzt, Eduard
- Kraft, Oliver
- Sanchez, J. E.
- Bader, S.
- Nix, William D.
- Saarländische Universitäts- und Landesbibliothek
Entstanden
- 2008
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