Electromigration resistance and mechanical strength: new perspectives for interconnect materials?
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
In: Thin films: stresses and mechanical properties III : symposium held December 2 - 5, 1991, Boston, Massachusetts, USA. - Pittsburgh, Pa : Materials Research Society, 1992. - (Materials Research Society symposium proceedings ; 239), S. 677-682
- Classification
-
Ingenieurwissenschaften und Maschinenbau
- Keyword
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Festigkeit ; Elektromigration
- Event
-
Veröffentlichung
- (where)
-
Saarbrücken
- (who)
-
Saarländische Universitäts- und Landesbibliothek
- (when)
-
2008
- Contributor
- URN
-
urn:nbn:de:bsz:291-scidok-17929
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 11:01 AM CEST
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Arzt, Eduard
- Kraft, Oliver
- Sanchez, J. E.
- Bader, S.
- Nix, William D.
- Saarländische Universitäts- und Landesbibliothek
Time of origin
- 2008
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