Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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1 Online-Ressource.
- Sprache
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Englisch
- Erschienen in
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Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition ; volume:13 ; number:1 ; day:3 ; month:3 ; year:2023 ; pages:1-7 ; date:12.2023
Scientific reports ; 13, Heft 1 (3.3.2023), 1-7, 12.2023
- Klassifikation
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Elektrotechnik, Elektronik
- Urheber
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Takakura, Ryo
Murakami, Seigo
Watanabe, Kaname
Takigawa, Ryo
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1038/s41598-023-30376-7
- URN
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urn:nbn:de:101:1-2024020911200573421131
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:32 MESZ
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Beteiligte
- Takakura, Ryo
- Murakami, Seigo
- Watanabe, Kaname
- Takigawa, Ryo
- SpringerLink (Online service)
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