Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Bibliographic citation
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Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films ; volume:4 ; pages:732-742
Beilstein journal of nanotechnology ; 4, 732-742
- Classification
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.4.83
- URN
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urn:nbn:de:101:1-2014052313324
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:49 AM CEST
Data provider
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
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