Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Erschienen in
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Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films ; volume:4 ; pages:732-742
Beilstein journal of nanotechnology ; 4, 732-742
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.4.83
- URN
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urn:nbn:de:101:1-2014052313324
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.0011, 09:49 MEZ
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