Hochschulschrift
On the mechanisms of hydrogen implantation induced silicon surface layer cleavage
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Dimensions
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28 cm
- Extent
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III, 196 S.
- Language
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Englisch
- Notes
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Ill., graph. Darst.
Marburg, Univ., Diss., 2001
- Keyword
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Silicium
Wasserstoff
Ionenimplantation
Abspalten
- Creator
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Höchbauer, Tobias
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 1:43 PM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Höchbauer, Tobias
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