Hochschulschrift | Online-Publikation
On the mechanisms of hydrogen implantation induced silicon surface layer cleavage
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
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Englisch
- Notes
-
Marburg, Univ., Diss., 2001
- Classification
-
Physik
- Keyword
-
Silicium
Wasserstoff
Ionenimplantation
Abspalten
- Creator
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Höchbauer, Tobias
- URN
-
urn:nbn:de:hebis:04-z2002-04033
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:57 PM CET
Data provider
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
- Online-Publikation
Associated
- Höchbauer, Tobias
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