- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
Sputtering of silicon nanopowders by an argon cluster ion beam ; volume:10 ; pages:135-143
Beilstein journal of nanotechnology ; 10, 135-143
- Classification
-
Ingenieurwissenschaften und Maschinenbau
- DOI
-
10.3762/bjnano.10.13
- URN
-
urn:nbn:de:101:1-2020102908524492349811
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:33 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Other Objects (12)
Focused Ion Beam Sputtering of Silicon and Related Materials
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
Monte-Carlo-Simulation geladener Argon- und Argon-Xenon-Cluster
Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations
Work Function Engineering of Thin α‐RuCl 3 by Argon Sputtering
Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide
Transition from ripples to faceted structures under low-energy argon ion bombardment of silicon: understanding the role of shadowing and sputtering
Development of ion beam sputtering for multilayer dispersive mirrors
Thin LixSi Films Produced by Ion Beam Sputtering
Optical diagnostics of the magnetron sputtering process of copper in an argon–oxygen atmosphere
Simulation of sputtering on silicon and graphene surfaces : molecular dynamics approach
Focused Ion Beam Sputtering of Silicon and Related Materials
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
Monte-Carlo-Simulation geladener Argon- und Argon-Xenon-Cluster
Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations
Work Function Engineering of Thin α‐RuCl 3 by Argon Sputtering
Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide
Transition from ripples to faceted structures under low-energy argon ion bombardment of silicon: understanding the role of shadowing and sputtering
Development of ion beam sputtering for multilayer dispersive mirrors
Thin LixSi Films Produced by Ion Beam Sputtering
Optical diagnostics of the magnetron sputtering process of copper in an argon–oxygen atmosphere
Simulation of sputtering on silicon and graphene surfaces : molecular dynamics approach
Focused Ion Beam Sputtering of Silicon and Related Materials
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
Monte-Carlo-Simulation geladener Argon- und Argon-Xenon-Cluster
Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations
Work Function Engineering of Thin α‐RuCl 3 by Argon Sputtering
Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide
Transition from ripples to faceted structures under low-energy argon ion bombardment of silicon: understanding the role of shadowing and sputtering
Development of ion beam sputtering for multilayer dispersive mirrors
Thin LixSi Films Produced by Ion Beam Sputtering
Optical diagnostics of the magnetron sputtering process of copper in an argon–oxygen atmosphere