Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations ; volume:13 ; pages:986-1003
Beilstein journal of nanotechnology ; 13, 986-1003
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.13.86
- URN
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urn:nbn:de:101:1-2022122114135465637722
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:36 MESZ
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