Hochschulschrift
Passive triggering of a high power hollow cathode EUV lamp for lithography
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783832249106
3832249109
- Dimensions
-
21 cm, 225 gr.
- Extent
-
150 S.
- Language
-
Englisch
- Notes
-
Ill., graph. Darst.
Zugl.: Aachen, Techn. Hochsch., Diss., 2005
- Classification
-
Physik
- Keyword
-
Lithografie
Extremes Ultraviolett
Hohlkathodenentladung
Pinch
Lithography
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.03.2025, 12:11 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Smith, Christopher Sydney
- Shaker
Time of origin
- 2006
Other Objects (12)
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Lithography.
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Intense electron beams produced in high voltage transient hollow-cathode discharges : comparative fundamental studies and applications
Direct lithography
Earthquake triggering and interaction
Binding versus triggering riboswitches
Triggering Art. 50 TEU
A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge
Hollow Skai
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Lithography.
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Intense electron beams produced in high voltage transient hollow-cathode discharges : comparative fundamental studies and applications
Direct lithography
Earthquake triggering and interaction
Binding versus triggering riboswitches
Triggering Art. 50 TEU
A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge
Hollow Skai
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Lithography.
Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography
Intense electron beams produced in high voltage transient hollow-cathode discharges : comparative fundamental studies and applications
Direct lithography
Earthquake triggering and interaction
Binding versus triggering riboswitches
Triggering Art. 50 TEU
A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge