Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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1 Online-Ressource.
- Language
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Englisch
- Bibliographic citation
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Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films ; volume:14 ; number:1 ; day:17 ; month:9 ; year:2024 ; pages:1-13 ; date:12.2024
Scientific reports ; 14, Heft 1 (17.9.2024), 1-13, 12.2024
- Creator
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Kümmerl, Pauline
Lellig, Sebastian
Navidi Kashani, Amir Hossein
Hans, Marcus
Pöllmann, Peter J.
Löfler, Lukas
Nayak, Ganesh Kumar
Holzapfel, Damian Mauritius
Kolozsvári, Szilárd
Polcik, Peter
Schweizer, Peter
Primetzhofer, Daniel
Michler, Johann
Schneider, Jochen M.
- Contributor
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SpringerLink (Online service)
- DOI
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10.1038/s41598-024-72134-3
- URN
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urn:nbn:de:101:1-2501132123569.372842719570
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:35 AM CEST
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Associated
- Kümmerl, Pauline
- Lellig, Sebastian
- Navidi Kashani, Amir Hossein
- Hans, Marcus
- Pöllmann, Peter J.
- Löfler, Lukas
- Nayak, Ganesh Kumar
- Holzapfel, Damian Mauritius
- Kolozsvári, Szilárd
- Polcik, Peter
- Schweizer, Peter
- Primetzhofer, Daniel
- Michler, Johann
- Schneider, Jochen M.
- SpringerLink (Online service)
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Computer vision assisted decomposition analysis of atom probe tomography data
Perspective on pathways towards responsible surface engineering
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Passivating oxidation behavior of Ti0.12Al0.21B0.67 coatings investigated by scanning transmission electron microscopy and chemical environment dependent density functional theory simulations
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