Hochschulschrift
The effect of Si and Y additives on the phase stability of Al2O3 thin films
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783844024951
- Maße
-
21 cm, 170 g
- Umfang
-
XIV, 92 S.
- Sprache
-
Englisch
- Anmerkungen
-
Ill., graph. Darst.
Zugl.: Aachen, Techn. Hochsch., Diss., 2013
- Erschienen in
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Materials chemistry dissertation ; No. 23
- Schlagwort
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Aluminiumoxide
Dünne Schicht
PVD-Verfahren
Mikrostruktur
Stabilität
Silicium
Yttrium
Additiv
Beschichtung
Beschichtungsanlage
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 14:14 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Nahif, Farwah
- Shaker
Entstanden
- 2014
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