Hochschulschrift
The effect of Si and Y additives on the phase stability of Al2O3 thin films
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783844024951
- Dimensions
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21 cm, 170 g
- Extent
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XIV, 92 S.
- Language
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Englisch
- Notes
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Ill., graph. Darst.
Zugl.: Aachen, Techn. Hochsch., Diss., 2013
- Bibliographic citation
-
Materials chemistry dissertation ; No. 23
- Keyword
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Aluminiumoxide
Dünne Schicht
PVD-Verfahren
Mikrostruktur
Stabilität
Silicium
Yttrium
Additiv
Beschichtung
Beschichtungsanlage
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 2:14 PM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Nahif, Farwah
- Shaker
Time of origin
- 2014
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